A New Calix[4]arene Based Barium Precursor for the Deposition of BaO-TiO2 Film

Citation:

Burtman, V. ; Aleksiuk, O. ; Kotler, Z. ; Meshulam, G. ; Berkovic, G. ; Yitzchaik, S. A New Calix[4]arene Based Barium Precursor for the Deposition of BaO-TiO2 Film. Chemistry of Materials 1997, 9 3101-3106.

Abstract:

In the present work we describe the design, syntheses, and use of a new barium metalloorganic precursor for barium titanate thin film deposition. Barium-containing thin films deposited by different deposition methods are widely used for various applications in optics and electronics. An important goal for applications is concerned with the production of stable, fluorine free barium-metalloorganic precursor materials, to obtain better performance photonic devices. We describe an alternative barium-metalloorganic precursor based on a calixarene ligand, its application to dip coating and thin film growth of the BaO−TiO2 family of compounds, and studies of these films by second harmonic generation. The BaTiO3 films showed promising nonlinear optical response for guided wave-applications.

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Last updated on 04/12/2016